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disilane

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  Post Date: Jul 20,2021
  Expiry Date: Jul 20,2022
  Detailed Description: Cas No. :1590-87-0 For solar cells, photosensitive rotating cylinder, amorphous silicon film, epitaxial growth, oxide film, nitride film, chemical vapor deposition, etc.In the production of solar cells, the deposition rate of ethylsilane on amorphous silicon wafer is much faster than that of silane, and the temperature can be reduced by 200 ~ 300℃.In ion implantation, ethylsilane as ion source is easy to glow and has strong beam current, and the effect is better than other gases as ion source.
It is used in the epitaxy and diffusion process in the semiconductor process, as well as in solar cells and photosensitive drums for electronic photography.

  CAS Registry Number:

1590-87-0

  Synonyms: Disilane
  Molecular Formula: H6Si2
  Molecular Weight: 62.2186
  Molecular Structure: 1590-87-0 disilane

  Company: Quanjiao Argotech electronic new material technology Co., Ltd     [ China ]        
  Contact: Murphy Song
  Tel: +8613913851441
  Fax:
  Email: murphysong@argotechs.com.cn
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