[Coop] Anisotropic wet etching representation and distribution
| Intention: | Some wet etchants etch crystalline materials at very different rates depending upon which crystal face is exposed. In single-crystal materials (e.g. silicon wafers), this effect can allow very high anisotropy, as shown in the figure.
Several anisotropic wet etchants are available for silicon. For instance, potassium hydroxide (KOH) can achieve selectivity of 400 between <100> and <111> planes. Another option is EDP (an aqueous solution of ethylene diamine and pyrocatechol), which also displays high selectivity for p-type doping. Neither of these etchants may be used on wafers that contain CMOS integrated circuits. Both of them etch aluminium, commonly used as a metallization (wiring) material. KOH introduces mobile potassium ions into silicon dioxide, and EDP is highly corrosive and carcinogenic. Tetramethylammonium hydroxide (TMAH) presents a safer alternative, although it has even worse selectivity between <100> and <111> planes in silicon than does EDP. |
| Profile : | Suzhou CSE Semiconductor Equipment Technology Co.,Ltd is a leading manufacturer of wet processing systems and distribution & service solutions provider serving the semiconductor,solar cell,photovoltaic and LCD manufacturing industries in China. Our main businesses include manufacturing wet processing systems of semiconductor,solar photovoltaic and LCD industries and providing OEM service for its overseas suppliers, representing and distribution related semiconductor,solar cell and LCD producing equipments including front-end and back-end. We provide innovative, professional wet cleaning solutions for semiconductor,solar cell and LCD manufacturers. Our customers include topping IC fabs, crystalline & polycrystalline silicon manufactures,electronic components suppliers,solar cell companies and LCD producers. Our key competitive strengths lie in our innovation, strong customer focus, strong partnership with customers and completely service support network. |
| Post Date : | Dec 04,2009 |
| Contact: | Amy Chang |
| Address: | 398 RuoShui Road, Industrial Park,suzhou |
| Tel: | +86-18913168552 |
| Fax: | +86-18913168552 |
| Email: | amychangcse@yahoo.com |
| URL: | www.hlcas.com |
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