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Photoinitiator FMT/ Photoinitiator 784
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| Post Date: | Aug 26,2017 |
| Expiry Date: | Aug 26,2018 |
| Detailed Description: |
Appearance: yellow to orange powder
Melting Point: 165-170 ℃ Purity: 99.0%min Volatility: 0.5%Max Character and Application: FMT is a kind of high-end UV and visible light photoinitiator with the same molecular structure as of the Ciba i-784 photoinitiator. It’s a very reactivefree radical type curing photoinitiator. FMT appears yellow to orange powdermelting point is at 165-170 ℃the typical absorptions are at 333nm396nm470 nmand the maximum absorption wavelength can amount to 560 nm. It’s the very good UV and visible light photoinitiator which can match argon laser 488 nm emission wavelengths. Its light trigger process neither belongs to cracking typenor belongs to deprive-hydrogen typebut after it absorbs the optical energyphotoinduced heterogeneous light responding cyclo-intermediates (A)then takes place ligands replacement with oligomer and ester carbonyl of acrylate in reactive diluentproduces free radicals (B)causes polymerization and crosslinking. It absorbs well in visible lighthas light-decolourizatio after photolysisis very suitable for visible light curing of thick coatingcan cure coating whose thickness is above 70 μm. Its thermal decomposition temperature is at 230℃so it wouldn’t vplazmtf when boiled in or sodium hydroxide for a few hours has excellent thermal stability. Our FMT’s lwonderful. It can initiate as long as gived 488nm illumination of 0.8mJ/cm2 in acrylate system. It is mainly used in high-tec and high value-added fieldssuch as argon laser scanning curingholographic laser imagerypolyimide photocuring PCB printing ink PCB and idental materials and it also can be used in UV coating UV printing ink UV adhesive photoresist. The usage of this product should base on the results of it can be used either individually or co-used with other photoinitiators according to the practical use conditions and the suggested volume of addition is 0.1-5 ‰ (w/w). Advantages: 1. Have light-decolourization 2. Be applicable for visible light curing of thick coating 3. Have excellent thermal stability 4. No residuum and the volume of addition is small 5. Can be used in brunet system and the is strong 6. no pollution no solvent evaporation 7. Photoinitiation is fast 8. The effect of Yellowing resistance is good |
| Company: | Wuhan Kemi-Works Chemical Co., Ltd [ China ] |
| Contact: | Dr. Allen Zhang |
| Tel: | 86-27-85736489 |
| Fax: | 86-27-85736485 |
| Email: | sales@kemiworks.com; info@kemiworks.net |
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